Numerical and Experimental Study of Silane/Hydrogen Plasma for Intrinsic Amorphous Silicon Film Deposition

碩士 === 國立清華大學 === 工程與系統科學系 === 104 === The purpose of this study is to investigate the influence of the plasma property on the thin film property. This study includes both experimental and simulation analysis, the simulation part used a two-dimensional fluid model for PECVD (Plasma enhanced chemical...

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Bibliographic Details
Main Authors: Chang, Chin Jung, 張進榮
Other Authors: Keh-Chyang Leou
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/04225087695340887418