Triple Patterning Lithography-aware Detailed Routing Ensuring Via Layer Decomposability

碩士 === 國立臺灣科技大學 === 電機工程系 === 104 === For sub-10 nanometer technology nodes, multiple patterning technologies are still the major solutions for pushing the limit of lithography due to the delay of next generation lithography technologies. In this thesis, we propose a triple patterning lithography (T...

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Bibliographic Details
Main Authors: Hua-Yi Wu, 吳華逸
Other Authors: Shao-Yun Fang
Format: Others
Language:en_US
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/3227bw