The study of resistive switching and voltage-controlled magnetic properties of HfO2 films

碩士 === 國立高雄大學 === 應用物理學系碩士班 === 104 === The ReRAM will be one of the most powerful potential memorial unit in next generation. The advantage includes in low-power operation, low cost, simple structure, and good retention. According to the previous research, hafnium oxide also share the same characte...

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Bibliographic Details
Main Authors: CHIOU,SHIN-RU, 邱信儒
Other Authors: HU,YU-MIN
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/7v9fmg