The study of different nitrogen flow rate in amorphous tantalum nitride applied to diffusion barrier and diffusion coefficient
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 104 === In this study, for apply to the diffusion barrier layer. we investigate the material properties of Amorphous tantalum nitride thin film which is manufacturing by using 4N Titanium target in reactive sputter,different nitrogen flow, RF magnetron sputter and...
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| Format: | Others |
| Online Access: | http://ndltd.ncl.edu.tw/handle/64xn8b |