Kai-Chun Chang

碩士 === 國立臺北科技大學 === 製造科技研究所 === 104 === In this study, first we tuned sputtering parameters to obtain the best thermoelectric properties of the film. And then, we used two methods which are lithography and shadow mask to fabricate thermoelectric microstructured devices. The first step, we used magne...

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Bibliographic Details
Main Authors: Kai-Chun Chang, 張凱鈞
Other Authors: 陳洋元
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/33668241704865506064