The Influence of Annealing on the Optical, Microstructural and Residual Stress Properties of Nanoscale MgF2 Thin Films

碩士 === 逢甲大學 === 光電能源與視覺科技碩士在職專班 === 105 === Abstract The nanoscale MgF2 thin films were deposited onto polished glass substrates by using thermal evaporation method. The film’s thicknesses are10, 20, 30, 40, 50 nm, respectively. After thin film deposition, the MgF2 films are annealed for 30 minutes...

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Bibliographic Details
Main Authors: LAI,TZU-WEN, 賴子文
Other Authors: TIEN,CHUEN-LIN
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/25093733800719897397