Intelligent Methods for Processing Parameters Optimization of ZnO Films
博士 === 國立高雄應用科技大學 === 電機工程系博碩士班 === 105 === In this study, we deposited Zinc oxide (ZnO) films at low temperature (<70℃) by using cathode arc plasma deposition (CAPD). The experimental designs are developed to determine the processing parameters. The influence of the parameters on Ti-doped ZnO...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91922710104040957858 |