Effects of Sputtering Parameters on the Performance of High-entropy Alloys (AlCrNbSiTiV)N Thin Films

碩士 === 龍華科技大學 === 機械工程系碩士班 === 105 === The main purpose of this study is to research (AlCrNbSiTiV)N thin films deposition on cermet cutting tools (TNMG160404R-UM T1200A) and glass substrates deposited by DC reactive magnetron sputtering. To explore different substrate temperatures (25, 100, 200, 300...

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Bibliographic Details
Main Authors: Yu, Zong-Han, 於宗翰
Other Authors: Chun, Yao-Hsu
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/mvf5gz