Wafer-size graphenes deposited on nickel foils by inductively coupled plasma enhanced thermal chemical vapor deposition
碩士 === 國立中興大學 === 材料科學與工程學系所 === 105 === Graphenes were deposited on nickel foils by inductively coupled plasma (ICP)-assisted thermal chemical vapor deposition. Methane, ammonia (NH3), and hydrogen (H2) were used as precursor gases, and the effects of different NH3 flow rates, different H2 etching...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53183474042031615743 |