Discussion on Management Technology of Electrostatic control in Semiconductor Factory
碩士 === 國立勤益科技大學 === 資訊工程系 === 105 === With the development of semiconductor process technology, prevention and management of electrostatic discharge have become the product reliability and yield control necessary procedures. Most product circuits and facilities are subject to electrostatic discharge...
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ndltd-TW-105NCIT53920072019-05-16T00:15:12Z http://ndltd.ncl.edu.tw/handle/c3s567 Discussion on Management Technology of Electrostatic control in Semiconductor Factory 晶圓廠靜電防制管理技術之研究 Wei-Ting Yu 余蔚庭 碩士 國立勤益科技大學 資訊工程系 105 With the development of semiconductor process technology, prevention and management of electrostatic discharge have become the product reliability and yield control necessary procedures. Most product circuits and facilities are subject to electrostatic discharge damage, the analysis has not developed anti-static management related. The results of this study, the establishment of electrostatic control standard operating procedures, additional anti-static facilities and regular verification and inspection, is to reduce the electrostatic hazards, to ensure the success rate of product enhance the way. In many areas of electrostatic discharge control is often discussed, due to the impact of a wide range, such as security, disaster prevention, precision instruments, the electronics industry yield ... etc., how to establish the ideal cost of security environment, production, is the engineer to overcome The problem. In this paper, the management and theory of electrostatic prevention, the application of self-inspection foundry management in the wafer, and to the Huangguang case of electrostatic discharge process, study and explore the cause of electrostatic discharge, analyze and record the improvement process has indeed achieved four expected performance, the first of which is to reduce the yellow fragment loss, the second is to reduce the yellow light Chamber the dust pollution, the number of crashes, and the third is to reduce the yellow district caused by the shock horror, then shut down, the fourth is to lower machine-level offset. Wen-Yuan Chen 陳文淵 2017 學位論文 ; thesis 90 zh-TW |
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碩士 === 國立勤益科技大學 === 資訊工程系 === 105 === With the development of semiconductor process technology, prevention and management of electrostatic discharge have become the product reliability and yield control necessary procedures. Most product circuits and facilities are subject to electrostatic discharge damage, the analysis has not developed anti-static management related. The results of this study, the establishment of electrostatic control standard operating procedures, additional anti-static facilities and regular verification and inspection, is to reduce the electrostatic hazards, to ensure the success rate of product enhance the way.
In many areas of electrostatic discharge control is often discussed, due to the impact of a wide range, such as security, disaster prevention, precision instruments, the electronics industry yield ... etc., how to establish the ideal cost of security environment, production, is the engineer to overcome The problem.
In this paper, the management and theory of electrostatic prevention, the application of self-inspection foundry management in the wafer, and to the Huangguang case of electrostatic discharge process, study and explore the cause of electrostatic discharge, analyze and record the improvement process has indeed achieved four expected performance, the first of which is to reduce the yellow fragment loss, the second is to reduce the yellow light Chamber the dust pollution, the number of crashes, and the third is to reduce the yellow district caused by the shock horror, then shut down, the fourth is to lower machine-level offset.
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author2 |
Wen-Yuan Chen |
author_facet |
Wen-Yuan Chen Wei-Ting Yu 余蔚庭 |
author |
Wei-Ting Yu 余蔚庭 |
spellingShingle |
Wei-Ting Yu 余蔚庭 Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
author_sort |
Wei-Ting Yu |
title |
Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
title_short |
Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
title_full |
Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
title_fullStr |
Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
title_full_unstemmed |
Discussion on Management Technology of Electrostatic control in Semiconductor Factory |
title_sort |
discussion on management technology of electrostatic control in semiconductor factory |
publishDate |
2017 |
url |
http://ndltd.ncl.edu.tw/handle/c3s567 |
work_keys_str_mv |
AT weitingyu discussiononmanagementtechnologyofelectrostaticcontrolinsemiconductorfactory AT yúwèitíng discussiononmanagementtechnologyofelectrostaticcontrolinsemiconductorfactory AT weitingyu jīngyuánchǎngjìngdiànfángzhìguǎnlǐjìshùzhīyánjiū AT yúwèitíng jīngyuánchǎngjìngdiànfángzhìguǎnlǐjìshùzhīyánjiū |
_version_ |
1719162109551443968 |