| Summary: | 碩士 === 國立成功大學 === 水利及海洋工程學系碩士在職專班 === 105 === This study investigated the process parameter in TFT-LCD substrate industrial cleaning system of a 6th generation substrate factory in Southern Taiwan Science Park. Because substrate manufacture uses an immense amount of water, process parameter optimization of substrate cleaning system reduces effluent and industrial water use.
This study investigated the physical cleaning methods (brush, high-pressure water of cleaning systems and discovered several possible problems. For example, non-uniform aqueous film distribution or insufficiently pressurized cleaning water is bad for substrate cleaning. As a result, reworking substrates with chemical agent for following production process increases production cost and wasted water. This study use different cleaning system process parameters together in order to improve cleaning system. After the substrate is fully coated with aqueous film, we increases revolution speed of cleaning brush, reconfigures the water-CDA gas ratio and HPMJ system to optimize production process. Eventually, we raised total yield rate by 0.05%, reduced substrate rework rate by 3% and reduced raw material requirement. 22,978,800TWD/year is saved by the total benefit of the above experiments
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