Effect of annealing on significant shift of Schottky Barrier Height at Metal /n-type Ge interface by inserting dielectric film

碩士 === 國立成功大學 === 電機工程學系 === 105

Bibliographic Details
Main Authors: Jia-JingLin, 林家敬
Other Authors: Wen-Hsi Lee
Format: Others
Language:en_US
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/s7wxbf