| Summary: | 碩士 === 國立成功大學 === 機械工程學系 === 105 === Patterning over the inner curved surface is important because it allows to obtain seamless flexible imprinting stamps. However, most of the available methods now are suitable for the roller mold with small size. In this study, a completely modified lithography technique is proposed to fabricate microstructure on a hollow mold with 200 mm in inner diameter and 150 mm in length. A spray coating method is adopted. A photoresist film with thickness varying from 5.0 to 6.0 µm is achieved. After that, excimer laser machining method is employed to fabricate a slender photo-mask which can be implemented for UV patterning on the inner surface of a hollow cylinder. On this photo-mask, array hexagonal grids with 30 µm linewidth and totally 145 mm long are prepared. Finally, a 405 nm UV laser diode scans with constant speed over the photo-mask and hence transfer the pattern on the photomask to the resist film. The exposure step is relatively time-saving. If the scanning speed is 30 mms-1, it takes more than one hour a little to pattern the whole roller mold (around 940 cm2 area). Although a seamless flexible stamp has still not achieved, this study demonstrates the potential and possibility of the proposed technique.
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