Deep-blue Light Phase-only LCoS for Maskless Holographic Etching Optical System
碩士 === 國立交通大學 === 光電工程研究所 === 105 === Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. Three LCoS panel uniformity error are below 1.5 % with fast response time. Reco...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/yse5zm |