Deep-blue Light Phase-only LCoS for Maskless Holographic Etching Optical System
碩士 === 國立交通大學 === 光電工程研究所 === 105 === Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. Three LCoS panel uniformity error are below 1.5 % with fast response time. Reco...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/yse5zm |
| Summary: | 碩士 === 國立交通大學 === 光電工程研究所 === 105 === Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. Three LCoS panel uniformity error are below 1.5 % with fast response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The phase modulation as a function of the spatial frequency was evaluated. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The phase distribution displayed on the SLM are derived from the Gerchberg-Saxton (GS) iterative Fourier transform algorithm (IFTA) and generated desired light distributions by adjusting the phase of a uniform wavefront. A pattern consist of ~ 2 μm thickness and the period stripe pattern ~ 35 μm width was demonstrated with simplified optical system.
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