Deep-blue Light Phase-only LCoS for Maskless Holographic Etching Optical System

碩士 === 國立交通大學 === 光電工程研究所 === 105 === Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. Three LCoS panel uniformity error are below 1.5 % with fast response time. Reco...

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Bibliographic Details
Main Authors: Chang, Wei-Tien, 張瑋恬
Other Authors: Chen, Huang-Ming
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/yse5zm

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