Characterization of Single-layer and Multi-layer Metal Films Contacts on P-Type Gallium Antimonide

碩士 === 國立交通大學 === 材料科學與工程學系所 === 105 === As the scaling of device continued shrinking, the Si-based complementary metal-oxide-semiconductor (CMOS) has faced difficulties in enhance the device performance due to the physical limitation. For the past few years, the introduction of alternative material...

Full description

Bibliographic Details
Main Authors: Cheng, Yu-Chieh, 鄭宇傑
Other Authors: Lin, Chien-Cheng
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/9896nt