Characterization of Single-layer and Multi-layer Metal Films Contacts on P-Type Gallium Antimonide

碩士 === 國立交通大學 === 材料科學與工程學系所 === 105 === As the scaling of device continued shrinking, the Si-based complementary metal-oxide-semiconductor (CMOS) has faced difficulties in enhance the device performance due to the physical limitation. For the past few years, the introduction of alternative material...

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Bibliographic Details
Main Authors: Cheng, Yu-Chieh, 鄭宇傑
Other Authors: Lin, Chien-Cheng
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/9896nt

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