Optimization of Vertical InAs/GaSb Hetero-Junction Tunneling Field-Effect Transistors

博士 === 國立交通大學 === 電子研究所 === 105 === The semiconductors technology has entered 10 nanometers generation node by 2016. In the near future, the semiconductors technology will reach 7/5 nanometers generation or even move toward the 3 dimensional stacking. However, accompanying the increase of device den...

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Bibliographic Details
Main Authors: Hsu, Ching-Yi, 徐慶議
Other Authors: Chang, Edward Yi
Format: Others
Language:en_US
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/nq64s2