Metal-insulator transition by using Schottky barrier in layered WSe2 transistors

碩士 === 國立交通大學 === 電子物理系所 === 105 === We have made few-layer tungsten diselenide (WSe2) field-effect transistors by using mechanical exfoliation with electron beam lithography, thermal evaporation, and post-annealing. The thickness of WSe2 flakes is determined using atomic force microscope. The devic...

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Bibliographic Details
Main Authors: Huang, Po-Yuan, 黃柏元
Other Authors: Jian, Wen-Bin
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/kxs98j