Surface Contamination Removal from the Side-wall of Nano-probe Using Wet Cleaning with Megasonic Waves
碩士 === 國立中央大學 === 機械工程學系 === 105 === Megasonic cleaning is possible to clean the nano-size particles without destroying the wafer surface characteristics. Therefore, cleaning the nano-size of the nano-probe must use to megasonic assist in cleaning. Wet cleaning RCA SC-1 has excellent removal efficie...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/bt3cra |