Design and Validation of a Spindle and Susceptor Holder for MOCVD Process

碩士 === 國立中央大學 === 機械工程學系 === 105 === Metal-organic Chemical Vapor Deposition (MOCVD) is a chemical vapor deposition method used for production of single or polycrystalline thin films. In order to improve the growth uniformity of thin film, a robust rotating spindle of the process equipment is essent...

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Bibliographic Details
Main Authors: Zong-Xuan Li, 李宗軒
Other Authors: Shyi-Jeng Tsai
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/enwv56