| Summary: | 碩士 === 國立中央大學 === 光電科學與工程學系 === 105 === Nowadays, an optical deposition technology is quite important for an optoeletronic industry. Optical thin films are indispensable parts of the accurate optical element. To improve the quality of thin film, it is necessary for the optical monitoring method in a deposition process.
In the study, reflection coefficient locus monitoring is used. The simulation analysis shows that the reflection coefficient monitoring diagram has more uniform monitoring sensitivity. Thus, it was used for providing good error compensation and easier termination judgment during the multilayer deposition.
For comparison, we fabricated anti-reflective coatings using reflection coefficient locus monitoring. The result shows that the average transmittance of the anti-reflective coatings is 95.0%. The error compared with design is 0.05%. The maximum of the standard deviation is 1.33%.
The real-time reflection coefficient of one single wavelength was acquired through the real-time broadband spectrum, and then it is direct monitoring system. An excellent performance of reflection coefficient monitoring for multilayer thin-film deposition has been demonstrated.
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