ZnO/MoO3 Superlattice Thin Films : Growth by Atomic Layer Deposition and Characterizations of Physical Properties
碩士 === 國立中山大學 === 物理學系研究所 === 105 === Superlattices of ZnO/MoO3 have been prepared by atomic layer deposition (ALD) on a-oriented sapphire substrates at 177 oC. The electrical properties were studied via measurement of resistivity as a function of temperature (T) from T=15 K to 300 K and magnetic fi...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/arq27b |