Numerical analysis on the methane/hydrogen plasma in a capacity-coupled PECVD reactor applied for diamond deposition
碩士 === 國立清華大學 === 動力機械工程學系 === 105 === In this study, we use fluid model to simulate capacity coupled plasma enhance chemical vapor deposition using in diamond deposition with CFD-ACE+. In order to simplify the simulation, we use sticking coefficient to define the species flux to the boundary and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/k39whc |