Multi-Patterning Aware Detailed Placement Refinement for Designs with Multi-Row Height Cells
碩士 === 國立清華大學 === 資訊工程學系 === 105 === As the feature size further decreases, multiple patterning lithography (MPL) has been regarded as one of the most promising lithography solutions, along with extreme ultraviolet lithography (EUVL), directed self-assembly (DSA), and electron beam lithography (EBL)...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/q8wuzp |