Deposition and Annealing Processes of Gate Stacks on 16 nm FinFETs

碩士 === 國立清華大學 === 工程與系統科學系 === 105 === abstract hide

Bibliographic Details
Main Authors: Lin, Chih-Ju, 林志儒
Other Authors: ChangLiao, Kuei-Shu
Format: Others
Language:zh-TW
Published: 2017
Online Access:http://ndltd.ncl.edu.tw/handle/7z5p8f