Oxidation behavior of high silicon content Ta–Si–N coatings in ambient air
碩士 === 國立臺灣海洋大學 === 材料工程研究所 === 105 === Ta–Si–N coatings were prepared using reactive direct current magnetron co-sputtering on silicon substrates. The sputter power was set at 100 W for each target, and the N2/(N2+Ar) was fixed at 0.1 to 0.4; the substrate holder rotated was set at 1 to 30 rpm. The...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/u8vbc4 |