Manufacturability Considering Routability and Mask-Fabrication Optimization for Next Generation Lithography
博士 === 國立臺灣大學 === 電子工程學研究所 === 105 === To further shrink layout features in advanced circuit designs, it is necessary to develop next-generation-lithography (NGL) technologies. According to the 2015 international technology roadmap for semiconductors (ITRS), directed self-assembly (DSA), electron be...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/p5m6bd |