Stitch-Aware Routing Considering Smart Boundary for Multiple E-Beam Lithography
碩士 === 國立臺灣科技大學 === 電機工程系 === 105 === As one of competitive next generation lithography (NGL), multiple electron beam lithography (MEBL) has been proposed to improve the low throughput issue. For this maskless lithography, each field is split into stripes that are slightly overlapped with each other...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/guxvc5 |