Stitch-Aware Routing Considering Smart Boundary for Multiple E-Beam Lithography
碩士 === 國立臺灣科技大學 === 電機工程系 === 105 === As one of competitive next generation lithography (NGL), multiple electron beam lithography (MEBL) has been proposed to improve the low throughput issue. For this maskless lithography, each field is split into stripes that are slightly overlapped with each other...
Main Authors: | Chih-Hsiang Hsu, 許智翔 |
---|---|
Other Authors: | Shao-Yun Fang |
Format: | Others |
Language: | en_US |
Published: |
2017
|
Online Access: | http://ndltd.ncl.edu.tw/handle/guxvc5 |
Similar Items
-
Fogging Effect Aware Multilevel Routing in Electron Beam Lithography
by: Chien Yu, et al.
Published: (2018) -
Servo System Design for Nano Pattern-Stitching in an Electron Beam Lithography System
by: Pablo Chiu, et al.
Published: (2010) -
Non-stitch Triple Patterning-Aware Routing Based on Conflict Graph Pre-coloring
by: Po-Ya Hsu, et al.
Published: (2013) -
Balancing Mask Density on Triple Patterning Lithography Aware Gridless Detailed Routing
by: Chi, Kai-Chih, et al.
Published: (2012) -
Data Compression Ratio-aware Detailed Routing for Multiple E-Beam Direct Write Systems
by: Yu-Hsiang Chiu, et al.
Published: (2015)