Study on the Properties of Tungsten Films Prepared by RF Magnetron Sputtering
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 105 === The study use the high-purity tungsten target (4N) to produce thin film by RF magnetron sputtering and change the numbers of quasi-collimators The sputtering power and argon flow were changed when the sputtering time was fixed. To analyze the surface proper...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/7vrgfy |