Structure and Mechanical Property of (AlCrNbSiTiV)N Films by Sputtering
碩士 === 龍華科技大學 === 機械工程系碩士班 === 106 === In this study, metal Ti and high-entropy alloys were used as targets, Ar was plasma gas, N₂ was reactive gas, high-power pulsed magnetron sputtering (HiPIMS) system, and (AlCrNbSiTiV)N nitride film was deposited on the tool and the stainless steel substrate. Th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/tavp64 |