Discussing mechanical properties of co-sputtering Al and TiSi2 thin films in oxygen atmosphere
碩士 === 明志科技大學 === 材料工程系碩士班 === 106 === In this study, the hard oxide film containing titanium (Ti), silicon (Si) and aluminum (Al) was prepared by co-sputtering of a titanium disilicide (TiSi2) target sputtered by RF power and a pure aluminum target sputtered by DC power; furthermore, the substrate...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/b4std9 |