Mechanism and Influence of Mn Dopant on the Electrical Properties of RRAM Using RF Sputtered Nb2O5Thin Films

碩士 === 國立成功大學 === 電機工程學系 === 106

Bibliographic Details
Main Authors: Che-WeiZhang, 張哲維
Other Authors: Cheng Liang Huang
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/2765j3