Effect of Conventional Plasma Charging Damage on High-K Gate Stack and Improvement in Neutral Beam Technology
碩士 === 國立成功大學 === 電機工程學系碩士在職專班 === 106 === Plasma fabrication, which is one of the most well-known and utilized technology in the present semiconductor industry. The advantages of this technology are capability of fabricating minute device and ability of control the direction of the ions. However, a...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/t5ewcm |