Characterization of AlxGa1-xN Epilayers and AlGaN/GaN 2DEG Heterostructures Grown by Molecular Beam Epitaxy

碩士 === 國立交通大學 === 電子物理系所 === 106 === A high crystal quality GaN channel layer, a series of 0% to 100% AlxGa1-xN ternary alloy, and AlGaN/GaN two-dimensional electron gas (2DEG) heterostructures have been grown by plasma-assisted molecular beam epitaxy (PA-MBE) on MOCVD-grown semi-insulating GaN temp...

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Bibliographic Details
Main Authors: Chang, Yu-Wei, 張祐維
Other Authors: Chou, Wu-Ching
Format: Others
Language:en_US
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/79gfsv