Numerical analysis of carbon concentration in GaN films growth via MOCVD in horizontal reactor

碩士 === 國立中央大學 === 能源工程研究所 === 106 === In recent years, GaN film materials are regarded as one of important future semiconductor materials because of their high temperature resistance, high voltage resistance and low resistance. Gallium nitride is produced by metal organic chemical vapor deposition (...

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Bibliographic Details
Main Authors: YE,ZHENG-WEI, 葉政緯
Other Authors: Chen, Jyh-Chen
Format: Others
Language:en_US
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/txrjz4