Machine learning of In-situ plasma monitoring in PECVD deposited amorphous (a-Si:H) passivation film
碩士 === 國立中央大學 === 光機電工程研究所 === 106 === The use of self-made plasma-assisted chemical vapor deposition (PECVD) to introduce indium methane (SiH4), hydrogen (H2), and argon (Ar) to produce an ultra-thin hydrogenated amorphous germanium passivation layer (< 10 nm) on a germanium substrate, The use o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/3cwge9 |