An Extreme-Ultraviolet Scatterometer with a High-Harmonic Generation Light Source

碩士 === 國立清華大學 === 光電工程研究所 === 106 === The semiconductor industry has applied different metrologies to optimize the manufacturing process and maintain certain quality of the final products. There are many tools used to control Critical Dimension (CD) of integrated circuits during each manufacturing p...

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Bibliographic Details
Main Authors: Wang, Wei-Ting, 王維廷
Other Authors: Chen, Ming-Chang
Format: Others
Language:en_US
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/mz42qf