An Extreme-Ultraviolet Scatterometer with a High-Harmonic Generation Light Source
碩士 === 國立清華大學 === 光電工程研究所 === 106 === The semiconductor industry has applied different metrologies to optimize the manufacturing process and maintain certain quality of the final products. There are many tools used to control Critical Dimension (CD) of integrated circuits during each manufacturing p...
Main Authors: | Wang, Wei-Ting, 王維廷 |
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Other Authors: | Chen, Ming-Chang |
Format: | Others |
Language: | en_US |
Published: |
2018
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Online Access: | http://ndltd.ncl.edu.tw/handle/mz42qf |
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