Graphene Growth on Copper Films by Plasma-Enhanced Chemical Vapor Deposition at Reduced Temperature
碩士 === 國立臺灣大學 === 光電工程學研究所 === 106 === In this master thesis, we discuss the way to optimize the growth of graphene by Plasma-Enhanced Chemical Vapor Deposition(PECVD); besides, using different substrates and structure designs. PECVD is a brand new process which carrys out at reduced temperature and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/u4f2ez |