Atomic Layer Deposition of Nitride for Interlayer on High-k Gate Stack and Etch-stop Layers
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 106 === This thesis is divided into two parts. In the first part, the nitride etching-stop-layer was improved by different ALD treatments. From the GIXRD analysis, the crystallinity of the nitride layer can be improved by plasma treatment which significantly enhance...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/usgj6e |