Fogging Effect Aware Multilevel Routing in Electron Beam Lithography
碩士 === 國立臺灣大學 === 電子工程學研究所 === 106 === Electron beam lithography (EBL) is one promising candidates among next-generation lithography (NGL) technology to conquer the resolution limit of the optical lithography. However, there are still challenges for EBL to apply practically in massive production. On...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/t3wb8a |