Development of DBO Model Based on Machine Learning
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 106 === Overlay metrology is a crucial process in the advanced process nodes of semiconductor manufacturing. Accurately measuring the overlay between the process layers effectively reduces the rework rate. Diffraction based overlay (DBO) is regarded as a critical ov...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2018
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Online Access: | http://ndltd.ncl.edu.tw/handle/2ap65z |