Development of DBO Model Based on Machine Learning

碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 106 === Overlay metrology is a crucial process in the advanced process nodes of semiconductor manufacturing. Accurately measuring the overlay between the process layers effectively reduces the rework rate. Diffraction based overlay (DBO) is regarded as a critical ov...

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Bibliographic Details
Main Authors: LIN,ZI-HAN, 林子寒
Other Authors: Hung-Fei Kuo
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/2ap65z