A Deep Learning Framework for Comprehensive Mask Optimization with SRAF Insertion and Edge-based OPC
碩士 === 國立臺灣科技大學 === 電機工程系 === 106 === With the dramatically increase of design complexity and the advance of semiconductor technology nodes, huge difficulties appear during design for manufacturability with existing lithography solutions. Sub-resolution assist feature (SRAF) insertion and optical pr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/8e33kk |