Numerical simulation analysis and optimization of microwave plasma chemical vapor deposition

碩士 === 國立臺北科技大學 === 機械工程系機電整合碩士班 === 106 === This thesis is analyzed, which is the cavity diamonds deposited in the microwave plasma jet chemical vapor deposition system that we currently used in laboratory. In this system process, by analyzing the cavity structure and the height of the internal hol...

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Bibliographic Details
Main Authors: CHUN-YU LIN, 林均昱
Other Authors: 許華倚
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/3z37xv