Analysis and Design of Heater for Temperature and Displacement Uniformity
碩士 === 大同大學 === 機械工程學系(所) === 106 === Temperature control in epitaxy process is a very important parameter in semiconductor process. Temperature changes during the crystallization process affect the quality of the finished product. Better quality of finished products can be achieved by effectively c...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2018
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Online Access: | http://ndltd.ncl.edu.tw/handle/tc6z7f |