Effect of Deposition Parameters On The Performances of VO2 Films Grown by Magnetron Sputtering
碩士 === 龍華科技大學 === 機械工程系碩士班 === 107 === In this study Vanadium dioxide (VO2) films prepared by use radio frequency magnetron sputtering (RF), Vanadium metal target(purity: 99.99%) and Vanadium dioxide target, Argon (Ar) as plasma gas, oxygen as reaction gas, sputtering VO2 on glass substrate. Using T...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/k2bnph |