| Summary: | 碩士 === 龍華科技大學 === 機械工程系碩士班 === 107 === In this study, a DC magnetron sputtering system was used to deposit multilayer films on nitride (MoN / ZrMoN) glass and SUS304 stainless steel substrates. The effects of reactive magnetron sputtering deposition parameters on MoN / ZrMoN rigid films were investigated. Change the Zr power of ZrMoN (50~250W), the thickness of intermediate MoN film (225~690nm), and the pretreatment of substrate plasma etching (duration 5~15min), and the microstructure and mechanical properties of MoN / ZrMoN multilayer. Impact. Film properties were measured by SEM, EDS, XRD, nanoindentation, frictional wear test and water droplet contact angle. As a result, it was found that the content of Zr was increased, and the crystal position of the (111) diffraction wave of the ZrMoN film was shifted to a low angle. Studies have shown that the MoN / ZrMoN friction coefficient and elastic recovery of a single MoN, ZrMoN, multilayer film MoN / ZrMoN and plasma etched substrate through the multilayer film are (8.22 GPa, 50.24%), respectively (11.95 GPa, 0.74, 64.93%) ), (12.53 GPa, 0.42, 58.69%), (13.87 GPa, 0.29, 62.77%). The substrate is processed by plasma etching to increase the surface roughness of the substrate. The contact angle of the water droplets was reduced from 85.0o to 58.4o, and the surface became hydrophilic, effectively improving the adhesion of the film. It shows that the MON / ZrMoN multilayer film has excellent mechanical properties. The best MoN / ZrMoN multilayer film in this study has excellent wear resistance. The hardness, friction coefficient and elastic recovery were 15.71 GPa, 0.21 and 66.65%, respectively.
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